Triode sputter ion pump commercially offered in various type from TSIP-8 to TSIP-1000 to all over the world with international standards and specifications since 1990.
Triode Sputter Ion Pump utilized in design hydrocarbon free ultra high vacuums. They make use of the high intensity cool cathode discharge stated in a magnetic field to sputter an extremely reactive material. The reactive material coating known as getter film combines with the energetic gas substances such as hydrogen, nitrogen, air, dihydrogen oxide vapour etc to create low vapour pressure steady compounds, thus lowering the amount of gas molecules as well as gas pressure in the volume.
Pump has greater pumping convenience of inert gases likened its forerunner diode sputter ion pump. ION pump can be installed on the systems in virtually any orientation. Please find all available types of ION pumps